DocumentCode :
3457162
Title :
Monolithic displacement encoder sensor integrating GaN LED and Si photodiodes
Author :
Nagai, Shuichi ; Sasaki, T. ; Kawaguchi, Hitoshi ; Iwabuchi, A. ; Hane, Kazuhiro
Author_Institution :
Tohoku Univ., Sendai, Japan
fYear :
2013
fDate :
16-20 June 2013
Firstpage :
972
Lastpage :
975
Abstract :
A GaN blue light emitting diode (LED) and Si photodiodes (PDs) are integrated monolithically on Si substrate for a micro optical displacement encoder sensor. A GaN-LED crystal layer was grown epitaxially on a Si substrate. Si pn-junction was formed subsequently on the Si substrate by P ion implantation. Therefore, all components necessary for the encoder sensor are integrated on a Si chip after patterning encoder gratings. The blue light is useful for improving diffraction effect and suitable for Si photodetector.
Keywords :
III-V semiconductors; displacement measurement; elemental semiconductors; gallium compounds; ion implantation; light emitting diodes; micro-optics; microsensors; monolithic integrated circuits; p-n junctions; photodiodes; silicon; wide band gap semiconductors; GaN; GaN-LED crystal layer; Si; Si photodiodes; Si pn-junction; Si substrate; blue light emitting diode; diffraction effect; encoder grating patterning; ion implantation; microoptical displacement encoder sensor; monolithic displacement encoder sensor; Gratings; Light emitting diodes; Optical device fabrication; Optical imaging; Optical sensors; Semiconductor device measurement; Silicon; Displacement Sensor; GaN-LED; MEMS Fabrication; Monolithic Integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
Type :
conf
DOI :
10.1109/Transducers.2013.6626931
Filename :
6626931
Link To Document :
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