• DocumentCode
    3457162
  • Title

    Monolithic displacement encoder sensor integrating GaN LED and Si photodiodes

  • Author

    Nagai, Shuichi ; Sasaki, T. ; Kawaguchi, Hitoshi ; Iwabuchi, A. ; Hane, Kazuhiro

  • Author_Institution
    Tohoku Univ., Sendai, Japan
  • fYear
    2013
  • fDate
    16-20 June 2013
  • Firstpage
    972
  • Lastpage
    975
  • Abstract
    A GaN blue light emitting diode (LED) and Si photodiodes (PDs) are integrated monolithically on Si substrate for a micro optical displacement encoder sensor. A GaN-LED crystal layer was grown epitaxially on a Si substrate. Si pn-junction was formed subsequently on the Si substrate by P ion implantation. Therefore, all components necessary for the encoder sensor are integrated on a Si chip after patterning encoder gratings. The blue light is useful for improving diffraction effect and suitable for Si photodetector.
  • Keywords
    III-V semiconductors; displacement measurement; elemental semiconductors; gallium compounds; ion implantation; light emitting diodes; micro-optics; microsensors; monolithic integrated circuits; p-n junctions; photodiodes; silicon; wide band gap semiconductors; GaN; GaN-LED crystal layer; Si; Si photodiodes; Si pn-junction; Si substrate; blue light emitting diode; diffraction effect; encoder grating patterning; ion implantation; microoptical displacement encoder sensor; monolithic displacement encoder sensor; Gratings; Light emitting diodes; Optical device fabrication; Optical imaging; Optical sensors; Semiconductor device measurement; Silicon; Displacement Sensor; GaN-LED; MEMS Fabrication; Monolithic Integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
  • Conference_Location
    Barcelona
  • Type

    conf

  • DOI
    10.1109/Transducers.2013.6626931
  • Filename
    6626931