Title :
Low temperature process below 170 °C for hydrophilic and hydrophobic micro patterns
Author :
Nakagami, C. ; Tonomura, W. ; Kaizuma, Y. ; Konishi, Satoshi
Author_Institution :
Ritsumeikan Univ., Kusatsu, Japan
Abstract :
This paper presents low temperature micromachining process (below 170 °C) of hydrophilic and hydrophobic materials for MEMS and μTAS. Proposed low temperature process can be applied even on poor heat resisting substrates such as paper. Paper-based μTAS employed photoresist to provide microfluidic paths and other functional patterns on paper. We reported low temperature surface treatment technology using pulse plasma CVD (hereafter PPCVD) to obtain hydrophilic/hydrophobic surface at low temperature. The SiOx/SiCx film deposited by PPCVD is used as a super hydrophilic/hydrophobic material. In this paper, we mainly demonstrated droplets patterning and microfluidic paths on paper by the hydrophilic/hydrophobic film using proposed low temperature process.
Keywords :
drops; hydrophilicity; hydrophobicity; low-temperature techniques; microfluidics; micromachining; paper; photoresists; plasma CVD; silicon compounds; MEMS device; PPCVD; SiOx-SiCx; droplet patterning; functional pattern; heat resisting substrate; hydrophilic micropattern; hydrophobic material; hydrophobic micropattern; low temperature micromachining process; microfluidic path; paper-based TAS; photoresist; pulse plasma CVD; super hydrophilic material; surface treatment technology; Films; Microfluidics; Resists; Silicon; Surface morphology; Surface treatment; Hydrophilic/hydrophobic pattern; Low temperature process; Paper-based μTAS; Pulse plasma CVD;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
DOI :
10.1109/Transducers.2013.6626966
