DocumentCode :
3459311
Title :
Dual-beam, six-terminal nanoelectromechanical relays
Author :
Harrison, K.L. ; Lee, Woo Seung ; Shavezipur, K. ; Provine, J. ; Mitra, Subhasish ; Wong, H.-S Philip ; Howe, R.T.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., Stanford, CA, USA
fYear :
2013
fDate :
16-20 June 2013
Firstpage :
1436
Lastpage :
1439
Abstract :
A novel design for a six-terminal nanoelectromechanical relay is presented. The design includes a secondary beam in the signal pathway of the device, which allows direct contact between the source and drain. The advantages of the new design include avoidance of fabrication-based contact degradation during the isolation etch, lower sensitivity to high gap variations and reduction in the number of contacts needed to close the signal pathway. Also, the new design introduces a novel anti-stiction mechanism. An analytical model is presented which compares the mechanical behavior of the new design to the older design. The devices are fabricated using a silicon nitride hard mask with an ammonium hydroxide based etchant. An inverter made using the new design is demonstrated.
Keywords :
etching; invertors; masks; mechanical contact; nanocontacts; nanoelectromechanical devices; nanofabrication; organic compounds; relays; ammonium hydroxide; antistiction mechanism; drain contact; dual-beam six-terminal nanoelectromechanical relay; etchant; fabrication-based contact degradation; inverter; isolation etching; signal pathway; silicon nitride hard mask; source contact; Contacts; Electrodes; Force; Inverters; Logic gates; Relays; Testing; nanoelectromechanical; relay; titanium nitride;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
Type :
conf
DOI :
10.1109/Transducers.2013.6627049
Filename :
6627049
Link To Document :
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