Title :
Automatic process design for 3D thick-film grayscale photolithography
Author :
van Kempen, F.C.M. ; Hirai, Yuki ; van Keulen, Fred ; Tabata, Osamu
Author_Institution :
Precision & Microsyst. Eng., Tech. Univ. Delft, Delft, Netherlands
Abstract :
A novel process optimization tool for grayscale lithography is developed and demonstrated to fabricate three-dimensional (3D) microstructures using thick-film photoresists. For the first time, the two process parameters in grayscale lithography: exposure dose profile and development time are determined automatically for a user-specified target 3D profile. This provides an inexpensive and effective alternative to conventional trial-and-error based process design. The optimized parameters were verified by fabricating various 3D microstructures and the experiments revealed good quantitative agreement with the target profile.
Keywords :
photoresists; process design; three-dimensional integrated circuits; 3D thick-film grayscale photolithography; automatic process design; development time; exposure dose profile; thick-film photoresists; three-dimensional microstructures; user-specified target 3D profile; Gray-scale; Lithography; Optimization methods; Resists; Surface treatment; Three-dimensional displays; 3D Microstructuring; Automatic Process Design; Design Optimization; Grayscale Photolithography;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
DOI :
10.1109/Transducers.2013.6627095
