DocumentCode :
3461441
Title :
High temperature micro-hotplates on porous silicon substrates
Author :
Lucklum, F. ; Schwaiger, A. ; Jakoby, Bernhard
Author_Institution :
Inst. for Microelectron. & Microsensors, Johannes Kepler Univ. Linz, Linz, Austria
fYear :
2013
fDate :
16-20 June 2013
Firstpage :
1907
Lastpage :
1910
Abstract :
Standard structures for micro-hotplate applications are generally thin, often suspended silicon nitride and silicon oxide membranes. These devices only offer limited mechanical stability. More mechanically stable, thicker glass substrates suffer from thermal stability issues at elevated temperatures. We propose the use of thick porous silicon substrates which offer better thermal (i.e. lower) conductivity than silicon nitride almost as low as silica glass, improved mechanical stability, and operation at temperatures comparable to membrane devices. Heater structures have been fabricated on fully porosified silicon wafers and are compared to reference glass and silicon samples.
Keywords :
electric heating; micromechanical devices; porous semiconductors; silicon; thermal conductivity; Si; heater structure; high temperature microhotplate; low thermal conductivity substrate; mechanical stability; membrane device; porosified silicon wafer; reference glass; thermal stability issues; thick porous substrate; Conductivity; Glass; Heating; Silicon; Substrates; Thermal conductivity; Thermal stability; 3ω-method; Porous silicon; high temperature; micro-hotplate; thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location :
Barcelona
Type :
conf
DOI :
10.1109/Transducers.2013.6627165
Filename :
6627165
Link To Document :
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