DocumentCode :
3461664
Title :
A process for fabricating robust electrothermal micromirrors with customizable thermal response time and power consumption
Author :
Pal, Shovon ; Xie, Huan
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
fYear :
2011
fDate :
8-11 Aug. 2011
Firstpage :
157
Lastpage :
158
Abstract :
A novel process for fabricating robust electrothermal bimorph based MEMS devices is reported and scanning electrothermal micromirrors are fabricated. Device parameters can be chosen to customize thermal response time and power requirements. Aluminum (Al) and Tungsten (W) form the active bimorph layers and polyimide is used for thermal isolation.
Keywords :
aluminium; micro-optomechanical devices; micromirrors; optical fabrication; tungsten; MEMS devices; active bimorph layers; electrothermal bimorph; electrothermal micromirrors; power consumption; thermal isolation; thermal response time; Actuators; Micromirrors; Polyimides; Robustness; Silicon; MEMS; electrothermal; micromirror; robust;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2011 International Conference on
Conference_Location :
Istanbul
ISSN :
2160-5033
Print_ISBN :
978-1-4577-0334-8
Type :
conf
DOI :
10.1109/OMEMS.2011.6031066
Filename :
6031066
Link To Document :
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