Title :
Antireflective subwavelength gratings on the end faces of optical fibers fabricated by UV nanoimprint lithography
Author :
Kanamori, Yoshiaki ; Okochi, M. ; Hane, Kazuhiro
Author_Institution :
Dept. of Nanomech., Tohoku Univ., Sendai, Japan
Abstract :
Antireflective subwavelength gratings (SWGs) with binary cross-sectional shapes were fabricated on the end faces of optical fibers by using UV nanoimprint lithography. A dedicated UV nanoimprinting machine to press the tip of an optical fiber to a mold was developed. The SWGs with the periods of 700 nm were fabricated at the tips of optical fibers. Their optical characteristics were measured.
Keywords :
diffraction gratings; nanolithography; optical fibre fabrication; ultraviolet lithography; antireflective subwavelength gratings; optical fiber fabrication; ultraviolet nanoimprint lithography; Fabrication; Gratings; Optical surface waves; Optical variables measurement; Reflectivity; Resins; Silicon; Subwavelength gratings; nanoimprint lithography; optical communications system; optical fibers;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2011 International Conference on
Conference_Location :
Istanbul
Print_ISBN :
978-1-4577-0334-8
DOI :
10.1109/OMEMS.2011.6031083
