Talbot lithography using aperiodic structures

Author

Choi, Hyoung Jin ; Hanhong Gao ; Lei Tian ; Chih-Hao Chang ; Jeong-Gil Kim ; Chih-Hung Hsieh ; Barbastathis, George

Author_Institution

Dept. of Mech. Eng., Massachusetts Inst. of Technol., Cambridge, MA, USA

fYear

2011

fDate

8-11 Aug. 2011

Firstpage

21

Lastpage

22

Abstract

We propose a phase-mask lithography scheme employing the Talbot field generated from aperiodic structures. In this approach, a 1-dimensional (1D) grating with fixed period and spatially varying duty-cycle is used to generate a 3-dimensional (3D) aperiodic intensity pattern, which can then be recorded by photoresist. Simulated intensity pattern using finite-difference time-domain (FDTD) method is used to design and optimize the duty-cycle profile of the aperiodic 1D grating. The proposed phase-mask can be patterned using electron-beam lithography directly on a fused silica substrate, and then used to fabricate complex aperiodic structure in direct contact exposure.

Keywords

Talbot effect; diffraction gratings; electron beam lithography; finite difference time-domain analysis; masks; optical fabrication; photoresists; 1-dimensional grating; FDTD; Talbot lithography; aperiodic structures; complex aperiodic structure; duty-cycle; electron-beam lithography; finite-difference time-domain method; fused silica substrate; phase-mask lithography; photoresist; simulated intensity pattern; Talbot; aperiodic structure; phase lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics (OMN), 2011 International Conference on

Conference_Location

Istanbul

ISSN

2160-5033

Print_ISBN

978-1-4577-0334-8

Type

conf

DOI

10.1109/OMEMS.2011.6031102

Filename

6031102