DocumentCode :
3462467
Title :
Temperature impact on the lorentzian noise induced by electron valance band tunneling in partiallydepleted SOI nMOSFETs
Author :
Guo, W. ; Cretu, B. ; Routoure, J.M. ; Carin, R. ; Simoen, E. ; Claeys, C.
Author_Institution :
GREYC, Caen
fYear :
2006
fDate :
Oct. 2006
Firstpage :
58
Lastpage :
60
Abstract :
In this paper, the temperature impact on the Lorentzian noise induced by electron valence band tunneling (EVB) is analyzed for partially depleted SOI MOSFETs. In (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004) the Lorentzian noise parameters were already studied at 300K and a model based on shot noise of the EVB tunneling current was proposed. The aim of this paper is to investigate the Lorentzian time constant tau and the plateau amplitude of the gate voltage noise spectral density SVG (0) variation versus temperature, where SVG (0) = SI (0)/(gm)2 . It is observed that from 300K down to 80K tau and SVG (0) exhibit behaviors in agreement with the existing model (Lukyanchikova et al., 2003) and (Lukyanchikova et al., 2004)
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; tunnelling; valence bands; 300 K; 80 K; Lorentzian noise parameters; Lorentzian time constant; electron valence band tunneling; gate voltage noise spectral density; nMOSFET; partially depleted SOI; plateau amplitude; temperature impact; tunneling current; Decision support systems; Electrons; MOSFETs; Quadratic programming; Temperature; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306076
Filename :
4098020
Link To Document :
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