DocumentCode :
3462537
Title :
Improving hot-electron reliability through circuit analysis and design
Author :
Wang, Hai ; De, Himadri ; Lahri, Rajeeva ; Haueisen, Don
Author_Institution :
Nat. Semicond. Co., Santa Clara, CA, USA
fYear :
1991
fDate :
9-11 April 1991
Firstpage :
107
Lastpage :
111
Abstract :
On-chip hot-electron test/stress structures have been developed. These structures provide insight into device degradation under real circuit operation. This makes it possible to accurately predict device lifetime in a specific circuit application. A methodology leading to novel hot-electron design guidelines is proposed based on the device operating conditions and its susceptibility to hot-electron effects. By following these guidelines, circuit reliability can be improved without adversely affecting circuits performance. The correlation between device and circuit degradation has been obtained through subcircuit analysis and simulation. As a result, hot-electron circuit lifetime can be used as one of the design parameters to insure long term reliability of the circuit. An example of reliability through design is given.<>
Keywords :
circuit reliability; hot carriers; integrated circuit testing; monolithic integrated circuits; circuit analysis; circuit reliability; device degradation; device lifetime; hot-electron reliability; long term reliability; operating conditions; subcircuit analysis; Circuit analysis; Circuit testing; Degradation; Frequency; Guidelines; Inverters; MOS devices; MOSFET circuits; Reliability engineering; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1991, 29th Annual Proceedings., International
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-87942-680-2
Type :
conf
DOI :
10.1109/RELPHY.1991.145995
Filename :
145995
Link To Document :
بازگشت