Operation of a silicon CMOS electron pump

We show the first measurements of a silicon electron pump produced in an industrial CMOS facility. Sample fabrication derived from state-of-the-art microelectronics processes results in mass production with high yield, very small sizes and easy operation up to high frequencies as these pump do not suffer from cross-capacitance. Further data with metrological assessment will be shown, as well as a a comparison of classical and non-adiabatic pumping modes within the same devices.