DocumentCode :
3463750
Title :
Effect Of Cl Incorporation On The Performance Of Amorphous Silicon Thin Film Transistor
Author :
Jong Hyun Choi ; Chang Soo Kim ; Sung Ki Kim ; Jin Jang
fYear :
1997
fDate :
13-14 Feb. 1997
Firstpage :
237
Lastpage :
240
Keywords :
Amorphous silicon; Hydrogen; Leakage current; Lighting; Optical films; Photoconductivity; Plasma temperature; Semiconductor films; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Information Display, 1997., Proceedings of the Fourth Asian Symposium on
Conference_Location :
Hong Kong, China
Print_ISBN :
962-8273-01-9
Type :
conf
DOI :
10.1109/ASID.1997.631446
Filename :
631446
Link To Document :
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