• DocumentCode
    3464931
  • Title

    Micro-strip spiral resonator in miniaturized inductively coupled plasma source

  • Author

    Zhou, Bei ; Liao, Bin ; Zhu, Shouzheng

  • Author_Institution
    Dept. of EE, East China Normal Univ., Shanghai
  • fYear
    2006
  • fDate
    23-26 Oct. 2006
  • Firstpage
    560
  • Lastpage
    562
  • Abstract
    With the growing demands on MEMS, miniaturized inductively coupled plasma (ICP) sources used in MEMS applications and MEMS fabrication processes have become more important. In order to build a low power and high efficiency ICP, a microstrip spiral resonator with capacitance-in-series structure (structure I) is proposed and analyzed. Resonating frequency tuning method and quality factor adjustment method are discussed according to the analysis. Under consideration of power efficiency, an improvement is made by using a new self-resonating circuit (structure II) which removes series-wound capacitance Ct in structure I. Simulation results show that structure II can achieve higher quality factor and can provide stronger electric field
  • Keywords
    microstrip resonators; plasma sources; MEMS applications; MEMS fabrication processes; capacitance-in-series structure; microstrip spiral resonator; miniaturized inductively coupled plasma source; quality factor adjustment method; resonating frequency tuning method; self-resonating circuit; Capacitance; Circuit optimization; Fabrication; Micromechanical devices; Microstrip resonators; Plasma applications; Plasma sources; Q factor; Resonant frequency; Spirals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306353
  • Filename
    4098166