Title :
Micro-strip spiral resonator in miniaturized inductively coupled plasma source
Author :
Zhou, Bei ; Liao, Bin ; Zhu, Shouzheng
Author_Institution :
Dept. of EE, East China Normal Univ., Shanghai
Abstract :
With the growing demands on MEMS, miniaturized inductively coupled plasma (ICP) sources used in MEMS applications and MEMS fabrication processes have become more important. In order to build a low power and high efficiency ICP, a microstrip spiral resonator with capacitance-in-series structure (structure I) is proposed and analyzed. Resonating frequency tuning method and quality factor adjustment method are discussed according to the analysis. Under consideration of power efficiency, an improvement is made by using a new self-resonating circuit (structure II) which removes series-wound capacitance Ct in structure I. Simulation results show that structure II can achieve higher quality factor and can provide stronger electric field
Keywords :
microstrip resonators; plasma sources; MEMS applications; MEMS fabrication processes; capacitance-in-series structure; microstrip spiral resonator; miniaturized inductively coupled plasma source; quality factor adjustment method; resonating frequency tuning method; self-resonating circuit; Capacitance; Circuit optimization; Fabrication; Micromechanical devices; Microstrip resonators; Plasma applications; Plasma sources; Q factor; Resonant frequency; Spirals;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
DOI :
10.1109/ICSICT.2006.306353