DocumentCode
3464931
Title
Micro-strip spiral resonator in miniaturized inductively coupled plasma source
Author
Zhou, Bei ; Liao, Bin ; Zhu, Shouzheng
Author_Institution
Dept. of EE, East China Normal Univ., Shanghai
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
560
Lastpage
562
Abstract
With the growing demands on MEMS, miniaturized inductively coupled plasma (ICP) sources used in MEMS applications and MEMS fabrication processes have become more important. In order to build a low power and high efficiency ICP, a microstrip spiral resonator with capacitance-in-series structure (structure I) is proposed and analyzed. Resonating frequency tuning method and quality factor adjustment method are discussed according to the analysis. Under consideration of power efficiency, an improvement is made by using a new self-resonating circuit (structure II) which removes series-wound capacitance Ct in structure I. Simulation results show that structure II can achieve higher quality factor and can provide stronger electric field
Keywords
microstrip resonators; plasma sources; MEMS applications; MEMS fabrication processes; capacitance-in-series structure; microstrip spiral resonator; miniaturized inductively coupled plasma source; quality factor adjustment method; resonating frequency tuning method; self-resonating circuit; Capacitance; Circuit optimization; Fabrication; Micromechanical devices; Microstrip resonators; Plasma applications; Plasma sources; Q factor; Resonant frequency; Spirals;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306353
Filename
4098166
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