DocumentCode
3464963
Title
Contamination control using production test data
Author
Kwon, Young Jun ; Walker, Duncan M H
Author_Institution
Dept. of Electr. Eng., Texas A&M Univ., College Station, TX, USA
fYear
1995
fDate
2-4 Oct 1995
Firstpage
70
Lastpage
76
Abstract
This paper presents a methodology to identify suspect process steps during ramp and maturity of an IC fabrication line by utilizing the production functional testing results and to generate a defect Pareto to prioritize defect contamination control
Keywords
chemical variables control; fault diagnosis; integrated circuit yield; probability; production control; production testing; semiconductor process modelling; surface contamination; CAD tools; EDA tools; IC fabrication line; defect Pareto; defect contamination control; production functional testing results; production test data; suspect process step identification; yield loss; Circuit faults; Circuit simulation; Circuit testing; Computational modeling; Contamination; Fabrication; Integrated circuit testing; Pollution measurement; Production; Semiconductor device measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Manufacturing Technology Symposium, 1995. 'Manufacturing Technologies - Present and Future', Seventeenth IEEE/CPMT International
Conference_Location
Austin, TX
Print_ISBN
0-7803-2996-1
Type
conf
DOI
10.1109/IEMT.1995.526095
Filename
526095
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