DocumentCode :
3465119
Title :
A 100nm Double-Stacked 500MHz 72Mb Separate-I/O Synchronous SRAM with Automatic Cell-Bias Scheme and Adaptive Block Redundancy
Author :
Sohn, Kyomin ; Suh, Young-Ho ; Son, Young-Jae ; Yim, Dae-Sik ; Kim, Kang-Young ; Bae, Dae-Gi ; Kang, Ted ; Lim, Hoon ; Jung, Soon-Moon ; Byun, Hyun-Geun ; Jun, Young-Hyun ; Kim, Kinam
Author_Institution :
Samsung Electron., Suwon
fYear :
2008
fDate :
3-7 Feb. 2008
Firstpage :
386
Lastpage :
622
Abstract :
As multi-core processors become mainstream, the demand for high-density cache memories has increased. Conventional 6T-cell-based SRAMs do not provide enough density for this trend, although they do have the desirable feature of high-speed access. To overcome the density limitation, an SRAM using a double- stacked S3 (stacked single-crystal Si) SRAM cell was introduced for mobile applications. This work demonstrates a high-speed SRAM using double-stacked-cell. From the process point of view, our design uses fully proven technologies for mass production at the sacrifice of cell size.From a circuit-design perspective, three schemes are introduced. They are automatic cell bias (ACB) for managing the current of SRAM cell transistors by controlling cell bias, adaptive block redundancy (ABR) for dealing with various defects from the new cell technology, and wordline pulse-width regulation (WPR) for adjusting wordline pulse-width according to cycle time.
Keywords :
SRAM chips; integrated circuit design; adaptive block redundancy; automatic cell-bias; circuit design; frequency 500 MHz; memory size 72 MByte; multi-core processors; size 100 nm; synchronous SRAM cell; wordline pulse-width regulation; Adaptive control; Automatic control; Cache memory; Circuits; Mass production; Multicore processing; Programmable control; Random access memory; Space vector pulse width modulation; Technology management;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-2010-0
Electronic_ISBN :
978-1-4244-2011-7
Type :
conf
DOI :
10.1109/ISSCC.2008.4523219
Filename :
4523219
Link To Document :
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