DocumentCode
3465312
Title
Compact In-Situ Sensors for Monitoring Negative-Bias-Temperature-Instability Effect and Oxide Degradation
Author
Karl, E. ; Singh, P. ; Blaauw, D. ; Sylvester, D.
Author_Institution
Univ. of Michigan, Ann Arbor, MI
fYear
2008
fDate
3-7 Feb. 2008
Firstpage
410
Lastpage
623
Abstract
The NBTI sensor proposed is intended to be used for general NBTI characterization and not in- situ monitoring of degradation, due to large area overhead (~450x area of NBTI sensor in this work), inability to correct for temperature variations encountered during operation and the analog output of the sensor. We introduce two compact structures to digitally quantify the change in performance and power of devices undergoing NBTI and defect-induced oxide breakdown. The small size of the sensors makes them amenable to use in a standard-cell design with low area and power overhead. The sensors can be implemented in large numbers to collect data on degradation and statistical performance of the devices.
Keywords
statistical analysis; temperature measurement; temperature sensors; thermal stability; NBTI sensor; analog output; compact in-situ sensors; defect-induced oxide breakdown; negative-bias-temperature-instability effect; oxide degradation; statistical performance; Calibration; Degradation; Frequency; MOS devices; Monitoring; Niobium compounds; Oscillators; Stress; Temperature sensors; Titanium compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
Conference_Location
San Francisco, CA
Print_ISBN
978-1-4244-2010-0
Electronic_ISBN
978-1-4244-2011-7
Type
conf
DOI
10.1109/ISSCC.2008.4523231
Filename
4523231
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