• DocumentCode
    3465312
  • Title

    Compact In-Situ Sensors for Monitoring Negative-Bias-Temperature-Instability Effect and Oxide Degradation

  • Author

    Karl, E. ; Singh, P. ; Blaauw, D. ; Sylvester, D.

  • Author_Institution
    Univ. of Michigan, Ann Arbor, MI
  • fYear
    2008
  • fDate
    3-7 Feb. 2008
  • Firstpage
    410
  • Lastpage
    623
  • Abstract
    The NBTI sensor proposed is intended to be used for general NBTI characterization and not in- situ monitoring of degradation, due to large area overhead (~450x area of NBTI sensor in this work), inability to correct for temperature variations encountered during operation and the analog output of the sensor. We introduce two compact structures to digitally quantify the change in performance and power of devices undergoing NBTI and defect-induced oxide breakdown. The small size of the sensors makes them amenable to use in a standard-cell design with low area and power overhead. The sensors can be implemented in large numbers to collect data on degradation and statistical performance of the devices.
  • Keywords
    statistical analysis; temperature measurement; temperature sensors; thermal stability; NBTI sensor; analog output; compact in-situ sensors; defect-induced oxide breakdown; negative-bias-temperature-instability effect; oxide degradation; statistical performance; Calibration; Degradation; Frequency; MOS devices; Monitoring; Niobium compounds; Oscillators; Stress; Temperature sensors; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 2008. ISSCC 2008. Digest of Technical Papers. IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    978-1-4244-2010-0
  • Electronic_ISBN
    978-1-4244-2011-7
  • Type

    conf

  • DOI
    10.1109/ISSCC.2008.4523231
  • Filename
    4523231