An improved CMOS-compatible bulk-silicon-micromachined microemitter for dynamic infrared scene projector

Author

Ma, Bin ; Pingzhi Liang ; Si, Junjie ; Chen, Erzhu ; Chen, Shijun ; Zhang, Xuemin ; Ding, Yi

Author_Institution

Shanghai Inst. of Tech. Phys.

fYear

2006

fDate

23-26 Oct. 2006

Firstpage

623

Lastpage

625

Abstract

An improved thermally isolated bulk-silicon-micromachined microemitter that can be applied for dynamic infrared scene projectors has been fabricated using commercial CMOS process followed by single step of post anisotropic silicon etching of TMAH mixture without any additional protection of aluminum pads. The physical structure and fabrication process of microemitter is optimized to ensure high apparent temperature, fast response and high temperature survivability of emitter element along with low-cost, high-yield of manufacturing

Keywords

etching; infrared detectors; micromachining; TMAH mixture; apparent temperature; bulk silicon micromachined microemitter; commercial CMOS process; dynamic infrared scene projector; fabrication process; improved CMOS-compatible microemitter; microheater; physical structure; post anisotropic silicon etching; thermally isolated microemitter; Aluminum; Anisotropic magnetoresistance; CMOS process; Etching; Fabrication; Layout; Manufacturing processes; Protection; Silicon; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on

Conference_Location

Shanghai

Print_ISBN

1-4244-0160-7

Electronic_ISBN

1-4244-0161-5

Type

conf

DOI

10.1109/ICSICT.2006.306395

Filename

4098187