Title :
Electron-beam processed SAW devices for sensor applications
Author :
Loschonsky, Marc ; Eisele, David ; Masson, Jeremy ; Alzuaga, Sébastien ; Dadgar, Armin ; Ballandras, Sylvain ; Reindl, Leonhard
Author_Institution :
Dept. of Microsyst. Eng. (IMTEK), Univ. of Freiburg, Freiburg
Abstract :
In this paper, electron-beam (e-beam) lithography for processing of surface acoustic wave devices is investigated, and its suitability for large-scale processing discussed. Electron-beam lithography is used for exposure of surface acoustic wave (SAW) resonator patterns on polymethyl methacrylate (PMMA) coated piezoelectric substrates. Electron-beam lithography can be used for high frequency SAW designs, due to a minimal finger width of 100 nm to 400 nm. Such SAW devices can be used for high-frequency sensor applications. This contribution will consider processing, on-wafer characterization, and characterization of sensor effects in instrumentation applications.
Keywords :
electron beam lithography; polymers; surface acoustic wave sensors; SAW devices; electron beam lithography; high-frequency sensor applications; instrumentation applications; on-wafer characterization; polymethyl methacrylate; resonator patterns; Acoustic sensors; Acoustic waves; Fingers; Frequency; Instruments; Large-scale systems; Lithography; Sensor phenomena and characterization; Surface acoustic wave devices; Surface acoustic waves; Electron beam lithography; high frequency; sensors; surface acoustic waves;
Conference_Titel :
Systems, Signals and Devices, 2009. SSD '09. 6th International Multi-Conference on
Conference_Location :
Djerba
Print_ISBN :
978-1-4244-4345-1
Electronic_ISBN :
978-1-4244-4346-8
DOI :
10.1109/SSD.2009.4956715
