DocumentCode :
3467043
Title :
Effect of Passivation on Increasing of AlGaN/GaN HEMT Gate Reverse Leakage
Author :
Chengzhan, Li ; Jian, Liu ; Xinyu, Liu ; Guoguo, Liu ; Dan, Liu ; Xiaojuan, Chen ; Zhijing, He
Author_Institution :
Inst. of Microelectron., Chinese Acad. of Sci., Beijing
fYear :
2006
fDate :
Oct. 2006
Firstpage :
908
Lastpage :
910
Abstract :
AlGaN/GaN HEMT gate leakage increasing induced by passivation was investigated by employing double gate surface leakage test structure, circle and rectangular Schottky contact structure and metal float gate structure. It was demonstrated that surface leakage is not a major contributor to increasing of gate leakage. Increase of gate leakage depends on augmenting of Schottky contact edge effect and inhibiting "visual gate" between gate and drain
Keywords :
III-V semiconductors; Schottky barriers; aluminium compounds; gallium compounds; high electron mobility transistors; leakage currents; passivation; wide band gap semiconductors; AlGaN-GaN; HEMT gate reverse leakage; Schottky contact edge effect; Schottky contact structure; double gate surface leakage test structure; gate leakage; high electron mobility transistor; metal float gate structure; passivation; Aluminum gallium nitride; Gallium nitride; Gate leakage; Gold; HEMTs; Leakage current; Passivation; Schottky barriers; Substrates; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306568
Filename :
4098273
Link To Document :
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