DocumentCode :
3467507
Title :
The Preparation of Large diameter Twin-free InP Crystals
Author :
Zhang, Weiyu ; Mao, Luhong ; Yang, Ruixia ; Kang, Xiaodong ; Zhou, Xiaolong ; Sun, Tongnian ; Sun, Niefeng
Author_Institution :
Coll. of Precision Instrum. & Opto-Electron. Eng., Tianjin Univ.
fYear :
2006
fDate :
23-26 Oct. 2006
Firstpage :
968
Lastpage :
970
Abstract :
InP substrates have been indispensable to both optical and electronic devices. The cost reduction in the manufacturing process of these devices and the increase in size of IC chips have strongly required a larger diameter of these substrate wafers. Promoted by this requirement, InP single crystal technology has been rapidly developed. In the present paper, the development and key technology of large diameter twin-free InP crystal growth are discussed
Keywords :
III-V semiconductors; crystal growth from melt; indium compounds; substrates; twin boundaries; IC chip size; InP; InP single crystal technology; InP substrate; cost reduction; large diameter twin-free InP crystal growth; larger diameter substrate wafer; manufacturing process; Agricultural engineering; Circuit synthesis; Costs; Crystals; Indium phosphide; Optical devices; Optical microscopy; Substrates; Temperature distribution; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306610
Filename :
4098293
Link To Document :
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