DocumentCode
3468156
Title
Effects of Quantized Energy Levels of QDs Confined in Asymmetric Barriers within Silicon Nanowire Transistor
Author
Chen, Jiezhi ; Shi, Yi ; Pu, Lin ; Zheng, Youdou ; Long, Shibing ; Liu, Ming
Author_Institution
Dept. of Phys., Nanjing Univ.
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
1068
Lastpage
1070
Abstract
Single-electron transistors with silicon nanowire channel are successfully fabricated using TMAH anisotropic etching and thermal oxidation method. Transport characteristics of devices are investigated with different source/drain bias at low temperatures. Clear negative differential conductance and CB oscillations with multiple fine peaks are observed, which can be successfully explained considering the asymmetric tunneling barriers and large quantized energy levels due to ultra-small quantum dots. Especially, double-peak coupling effect is observed in Ids-Vg characteristics for the first time
Keywords
energy states; etching; nanowires; oxidation; semiconductor quantum dots; silicon; single electron devices; tunnelling; CB oscillations; QD; Si; TMAH anisotropic etching; asymmetric barriers; double-peak coupling effect; negative differential conductance; quantized energy levels; quantum dots; silicon nanowire channel; silicon nanowire transistor; single-electron transistors; source/drain bias; thermal oxidation method; Energy states; Etching; Nanoscale devices; Oxidation; Plasma temperature; Rough surfaces; Silicon; Single electron transistors; Tunneling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306683
Filename
4098324
Link To Document