• DocumentCode
    3468156
  • Title

    Effects of Quantized Energy Levels of QDs Confined in Asymmetric Barriers within Silicon Nanowire Transistor

  • Author

    Chen, Jiezhi ; Shi, Yi ; Pu, Lin ; Zheng, Youdou ; Long, Shibing ; Liu, Ming

  • Author_Institution
    Dept. of Phys., Nanjing Univ.
  • fYear
    2006
  • fDate
    23-26 Oct. 2006
  • Firstpage
    1068
  • Lastpage
    1070
  • Abstract
    Single-electron transistors with silicon nanowire channel are successfully fabricated using TMAH anisotropic etching and thermal oxidation method. Transport characteristics of devices are investigated with different source/drain bias at low temperatures. Clear negative differential conductance and CB oscillations with multiple fine peaks are observed, which can be successfully explained considering the asymmetric tunneling barriers and large quantized energy levels due to ultra-small quantum dots. Especially, double-peak coupling effect is observed in Ids-Vg characteristics for the first time
  • Keywords
    energy states; etching; nanowires; oxidation; semiconductor quantum dots; silicon; single electron devices; tunnelling; CB oscillations; QD; Si; TMAH anisotropic etching; asymmetric barriers; double-peak coupling effect; negative differential conductance; quantized energy levels; quantum dots; silicon nanowire channel; silicon nanowire transistor; single-electron transistors; source/drain bias; thermal oxidation method; Energy states; Etching; Nanoscale devices; Oxidation; Plasma temperature; Rough surfaces; Silicon; Single electron transistors; Tunneling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    1-4244-0160-7
  • Electronic_ISBN
    1-4244-0161-5
  • Type

    conf

  • DOI
    10.1109/ICSICT.2006.306683
  • Filename
    4098324