DocumentCode :
3468503
Title :
Electron Velocity Saturation and Probable Cross-Section Area of Leakage Current Path Post Soft Breakdown (SBD) in Ultrathin Gate Oxides
Author :
Xu, Ming-Zhen ; Tan, Chang-Hua
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing
fYear :
2006
fDate :
23-26 Oct. 2006
Firstpage :
1122
Lastpage :
1125
Abstract :
The post soft breakdown (SBD) current saturation behavior was studied on the basis of electron velocity saturation concept by using the proportional difference operator (PDO) method. It is shown that the proportional difference peak height and position of the post soft breakdown I-V curves are related to the saturation current density and the saturation velocity of electron in SBD path, respectively. The probable cross-section size of post SBD leakage current path in SiO2 is studied based on the defect scattering mechanism also
Keywords :
current density; difference equations; leakage currents; semiconductor device breakdown; silicon compounds; electron velocity saturation; leakage current path post soft breakdown; probable cross-section area; proportional difference operator method; saturation current density; ultrathin gate oxides; Conductors; Current density; Current measurement; Electric breakdown; Electron mobility; Leakage current; Microelectronics; Optical scattering; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
1-4244-0160-7
Electronic_ISBN :
1-4244-0161-5
Type :
conf
DOI :
10.1109/ICSICT.2006.306700
Filename :
4098341
Link To Document :
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