• DocumentCode
    3469223
  • Title

    High performance microwave air-bridge resonators

  • Author

    Seabury, C.W. ; Cheung, J.T. ; Kobrin, P.H. ; Addison, R. ; Havens, D.P.

  • Author_Institution
    Sci. Center, Rockwell Int. Corp., Thousand Oaks, CA, USA
  • Volume
    2
  • fYear
    1995
  • fDate
    7-10 Nov 1995
  • Firstpage
    909
  • Abstract
    We have used pulsed laser deposition and a dry release process to produce freestanding zinc oxide films for bulk mode microwave acoustic resonators. Laser assisted deposition is used to produce ZnO films with very low (slightly tensile) stress at temperatures below 200°C. They have a high degree of orientation, C axis X-ray ½ width ~0.24°, resistivity greater than 1010 ohm cm and loss tangent below 0.01 at 10 MHz. Resonators with Qs of over 350 with Kem of 0.22 at 1.5 GHz have been produced. An air-bridge process has been used to produce undistorted freestanding membranes up to 400 μm sq., with single mode resonance characteristics. The use of an inorganic sacrificial layer and a dry release etch avoids the problem of surface tension that occurs in wet chemical etching, resulting in high yield. The process also allows for on-wafer frequency trimming. Multipole band pass filters have been designed based on the discrete resonator results, and have been fabricated using this process. A rejection of 28 dB and an insertion loss of -7 dB have been achieved. The high yield and good uniformity make this a practical, low-cost process for producing complex multipole filter structures suitable for 1-3 GHz mobile communications
  • Keywords
    UHF filters; acoustic microwave devices; acoustic resonator filters; acoustic resonators; band-pass filters; bulk acoustic wave devices; dielectric losses; microwave filters; pulsed laser deposition; sputter etching; zinc compounds; -7 dB; 1 to 3 GHz; 1.5 GHz; 200 C; ZnO; bulk mode microwave acoustic resonators; dry release etch; free standing ZnO films; high yield; inorganic sacrificial layer; insertion loss; loss tangent; microwave air-bridge resonators; mobile communications; multipole band pass filters; on-wafer frequency trimming; orientation; pulsed laser deposition; rejection; resistivity; single mode resonance characteristics; undistorted free standing membranes; very low tensile stress; Acoustic pulses; Dry etching; Film bulk acoustic resonators; Laser modes; Masers; Pulsed laser deposition; Tensile stress; Wet etching; X-ray lasers; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 1995. Proceedings., 1995 IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    1051-0117
  • Print_ISBN
    0-7803-2940-6
  • Type

    conf

  • DOI
    10.1109/ULTSYM.1995.495712
  • Filename
    495712