DocumentCode
3469468
Title
Analytical Model for Surface Electrical Field of Double RESURF LDMOS with Field Plate
Author
Gao, Shan ; Chen, Junning ; Ke, Daoming ; Liu, Lei
Author_Institution
Dept. of Electron. Sci. & Technol., Anhui Univ., Hefei
fYear
2006
fDate
23-26 Oct. 2006
Firstpage
1324
Lastpage
1326
Abstract
An analytical model for surface electrical field distribution along the drift region of double RESURF LDMOS with the gate and the drain field plates is presented, which takes the influence of non-uniformly doping concentration into account. Based on the 2D Poisson equation, the model provides an closed solution of electrical field distribution including the off-state and the on-state under different bias. The analytical results are verified by the semiconductor device simulator MEDICI and are analyzed based on optimization devices
Keywords
Poisson equation; electric fields; power MOSFET; semiconductor device models; 2D Poisson equation; MEDICI; analytical model; double RESURF LDMOS; electrical field distribution; field plate; nonuniformly doping concentration; optimization device; surface electrical field; Analytical models; Electric breakdown; MOSFETs; Medical simulation; Poisson equations; Power integrated circuits; Semiconductor device doping; Semiconductor devices; Semiconductor process modeling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306149
Filename
4098397
Link To Document