28 nano-meter back end lithography productivity cycle time improvement 40%

Author

Rui-Pei Wang ; Yee-Lun Kao ; Guan-Cyun Li ; Chieh-Huan Ku ; Chien-Chih Lan ; Feng-Ning Lee

Author_Institution

Taiwan Semicond. Manuf. Co., Ltd., Hsinchu, Taiwan

fYear

2013

fDate

6-6 Sept. 2013

Firstpage

1

Lastpage

3

Abstract

The main objective of this study is to develop systems for 28 nano-meter back end lithography productivity cycle time improvement. The paper surveys applications of Queueing theory, Fuzzy theory and OR for system development. We develop four systems such as Loading forecast system, Photo all in one, OD (Oxide Definition) intelligent scheduling system, Self accelerating system and Scanner dashboard which can linearize tool utilization, predict coming WIP (Work In Process) in future, coming WIP variation minimization and monitor tool unit status respectively. Finally, the lithography productivity cycle time reduction can be achieved 40%.

Keywords

forecasting theory; fuzzy set theory; lead time reduction; lithography; nanotechnology; productivity; queueing theory; scheduling; work in progress; WIP variation; fuzzy theory; intelligent scheduling system; loading forecast system; nanometer back end lithography productivity cycle time improvement; oxide definition; queueing theory; scanner dashboard; self accelerating system; work in process; Abstracts; Approximation methods; Joints; Maintenance engineering; Manganese; Cycle time; Lithography; Nano;

fLanguage

English

Publisher

ieee

Conference_Titel

e-Manufacturing & Design Collaboration Symposium (eMDC), 2013

Conference_Location

Hsinchu

Type

conf

DOI

10.1109/eMDC.2013.6756035

Filename

6756035