DocumentCode
3470009
Title
Automistic modeling of direct tunnelling in metal-oxide-semiconductor nanostructures
Author
Liu, Lei ; Waldron, Derek ; Timochevski, Vladimir ; Guo, Hong
Author_Institution
Dept. of Phys., McGill Univ., Montreal, Que.
fYear
2006
fDate
Oct. 2006
Firstpage
1415
Lastpage
1418
Abstract
The authors report an atomistic modeling formalism and its associated software tool for simulating nonlinear and nonequilibrium charge transport in nanostructures from quantum mechanical first principles. This formalism is based on carrying out density functional theory (DFT) within the Keldysh nonequilibrium Green´s function (NEGF) framework. The authors have calculated tunnelling current in metal-SiO 2-nSi MOS structures from atomic point of view using the NEGF-DFT approach and compare our results to those obtained by traditional tunnelling formula and identify a number of important issues to be resolved toward establishing parameter-free atomistic modeling of semiconductor nanoelectronics
Keywords
Green´s function methods; MIS structures; density functional theory; nanoelectronics; quantum theory; silicon compounds; tunnelling; Keldysh nonequilibrium Green function; SiO2; density functional theory; direct tunnelling; metal-oxide-semiconductor nanostructures; nonequilibrium charge transport; nonlinear charge transport; quantum mechanical first principles; Atomic layer deposition; Bonding; Density functional theory; Dielectric devices; Dielectric thin films; Green´s function methods; Leakage current; Nanostructures; Physics; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 2006. ICSICT '06. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
1-4244-0160-7
Electronic_ISBN
1-4244-0161-5
Type
conf
DOI
10.1109/ICSICT.2006.306200
Filename
4098426
Link To Document