Active feedback control of reactive sputtering AlN thin film fro FBAR

AlN thin films with high c-axis orientation are deposited by DC reactive magnetron sputtering and active feedback control system. Based on the analysis of the Berg hysteresis model, the authors analyze the technology parameter influence on the hysteresis effect, including pumping speed, temperature of substrate and target, input power, target to substrate distance and area of target. A new active feedback control method and some improvement to eliminate hysteresis effect are presented to quickly depositing AlN thin film with high c-axis oriented