OPC model calibration based on circle-sampling theorem

A new efficient OPC model calibration method for optical lithography process is presented. The method is based on the applying of circle-sampling theorem in the description of mask and optical system. A new point intensity calculation method is then obtained from the representation of TCC and mask using a group of selected circle sampling functions. Then the CD value is computed using the constant threshold model (CTR). In this study, genetic algorithm was first used to optimize the diagonal elements of the new derived TCC matrix. This way, good optimized results were obtained with different sets of optical proximity efficient data