Title :
P2ID 2002 industry survey of semiconductor process-induced damage
Author :
Hook, T. ; Eriguchi, Koji ; Thuy Dao ; Alba, S. ; Aum, P.
Author_Institution :
STMicroelectronics
Abstract :
This is the first international semiconductor industry survey regarding PID ("Process Induced Damage") on semiconductor devices by P2ID. The purpose of P2ID is in understanding and managing PID issues faced by the semiconductor industry.
Keywords :
integrated circuit manufacture; radiation effects; semiconductor technology; surface charging; P2ID 2002 industry survey; PID issues; process induced damage; semiconductor industry; semiconductor process-induced damage; Computer aided manufacturing; Design engineering; Integrated circuit layout; Integrated circuit manufacture; Integrated circuit reliability; Manufacturing processes; Plasma applications; Plasma devices; Power engineering and energy; Reliability engineering;
Conference_Titel :
Plasma- and Process-Induced Damage, 2003 8th International Symposium
Print_ISBN :
0-7803-7747-8
DOI :
10.1109/PPID.2003.1200934
