Title :
Survey of semiconductor process-induced damage
Keywords :
Computer aided manufacturing; Design engineering; High-K gate dielectrics; Integrated circuit manufacture; Manufacturing processes; Plasma applications; Plasma devices; Plasma materials processing; Power engineering and energy; Reliability engineering;
Conference_Titel :
Plasma- and Process-Induced Damage, 2003 8th International Symposium
Print_ISBN :
0-7803-7747-8
DOI :
10.1109/PPID.2003.1200936
