• DocumentCode
    3471585
  • Title

    Survey of semiconductor process-induced damage

  • fYear
    2003
  • fDate
    24-25 April 2003
  • Firstpage
    117
  • Lastpage
    121
  • Keywords
    Computer aided manufacturing; Design engineering; High-K gate dielectrics; Integrated circuit manufacture; Manufacturing processes; Plasma applications; Plasma devices; Plasma materials processing; Power engineering and energy; Reliability engineering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma- and Process-Induced Damage, 2003 8th International Symposium
  • Print_ISBN
    0-7803-7747-8
  • Type

    conf

  • DOI
    10.1109/PPID.2003.1200936
  • Filename
    1200936