Determination of Metallic Impurities in Various Semiconductor Chemicals by Using ORS Quadruploe ICP-MS

This paper describes the determination of metallic impurities in various semiconductor chemicals by direct sample introduction and ORS (octopole reaction system) quadrupole ICP-MS analysis. Spike recovery test of seven elements (Na, Al, Ca, Cr, Fe, Ni, and Cu) are performed for nine chemicals (NH₄OH, TMAH, SC-1, HCl, HNO₃, H₂O₂, H₃PO₄, HF, and BHF). Our results shows that the spike recovery rates of seven elements are all within the range of 75 ~ 110% with 100ppt spiked solution. It is worthy to mention a better spike recovery is found for the H₂O₂ sample prepared in 1% HNO₃, instead of DIW. All the elements´ DL and BEC are less than 10 ppt in 1% HNO₃ matrix solution