• DocumentCode
    3475310
  • Title

    Effect of Photo Misalignment on N-LDMOS Hot Carrier Device Reliability

  • Author

    Brisbin, Douglas ; Lindorfer, Philipp ; Chaparala, Prasad

  • Author_Institution
    National Semicond. Corp., Santa Clara, CA
  • fYear
    2006
  • fDate
    Oct. 16 2006-Sept. 19 2006
  • Firstpage
    44
  • Lastpage
    48
  • Abstract
    Power management devices often require operation in the 20 V to 30 V range. A common choice for the power MOS driver is an n-channel lateral DMOS (N-LDMOS) device. An advantage of N-LDMOS device is that it can easily be integrated within existing technologies to handle a wide range of operating voltages without significant process changes. Because of the high voltages applied to the N-LDMOS device hot carrier (HC) degradation is a real reliability concern. In high power applications N-LDMOS devices are often implemented in transistor arrays where the basic cell is a dual gate single drain device. This paper focuses on understanding unusual N-LDMOS HC results in which single gate devices had significantly better HC performance than dual gate devices
  • Keywords
    MIS devices; hot carriers; semiconductor device reliability; N-LDMOS hot carrier device reliability; dual gate single drain device; photo misalignment effect; transistor arrays; CMOS technology; Degradation; Displays; Energy management; Hot carriers; Mirrors; Semiconductor device reliability; Stress; Switches; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2006 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    1-4244-0296-4
  • Electronic_ISBN
    1930-8841
  • Type

    conf

  • DOI
    10.1109/IRWS.2006.305208
  • Filename
    4098685