DocumentCode :
3475557
Title :
Non-Arrhenius Temperature Acceleration and Stress-Dependent Voltage Acceleration for Semiconductor Device Involving Multiple Failure Mechanisms
Author :
Qin, Jin ; Bernstein, Joseph B.
Author_Institution :
Maryland Univ., College Park, MD
fYear :
2006
fDate :
Oct. 16 2006-Sept. 19 2006
Firstpage :
93
Lastpage :
97
Abstract :
In this paper, we study temperature and voltage acceleration of semiconductor device with multiple intrinsic failure mechanisms involved: hot carrier injection (HCI), time dependent dielectric breakdown (TDDB) and negative bias temperature instability (NBTI). Simulation shows that system activation energy and voltage acceleration parameter depend on stress temperature and voltage. A modified Arrhenius relationship is proposed to model the temperature dependence of device lifetime at given voltage. A modified exponential model is also proposed to model the voltage dependence of device lifetime at given temperature
Keywords :
hot carriers; semiconductor device breakdown; semiconductor device models; semiconductor device reliability; thermal stability; hot carrier injection; modified Arrhenius relationship; modified exponential model; multiple failure mechanisms; negative bias temperature instability; non-Arrhenius temperature acceleration; semiconductor device; stress-dependent voltage acceleration; system activation energy; temperature dependence; time dependent dielectric breakdown; Acceleration; Breakdown voltage; Dielectric breakdown; Failure analysis; Hot carrier injection; Human computer interaction; Negative bias temperature instability; Niobium compounds; Semiconductor devices; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location :
South Lake Tahoe, CA
ISSN :
1930-8841
Print_ISBN :
1-4244-0296-4
Electronic_ISBN :
1930-8841
Type :
conf
DOI :
10.1109/IRWS.2006.305219
Filename :
4098696
Link To Document :
بازگشت