Title :
Residual resistivity model and its application
Author :
Doyen, L. ; Federspiel, X. ; Ney, D. ; Sers, G. ; Giraulf, V. ; Arnaud, L. ; Wouters, Y.
Author_Institution :
Philips Semicond., Crolles
fDate :
Oct. 16 2006-Sept. 19 2006
Abstract :
Taking into account Matthiessen´s rules, we have developed a model of residual resistivity with line dimensions. The method developed allows distinguishing the effect of impurities and the sizing effect. Thus we are able to determine line dimensions consistent with process variation. Finally this model allows an appreciable evaluation of the TCR
Keywords :
electrical conductivity; thermal conductivity; thermal resistance; Matthiessen´s rules; electrical conductivity; line dimensions; residual resistivity model; thermal coefficient of resistance; Conductivity; Copper; Electric resistance; Electrical resistance measurement; Electrons; Equations; Grain boundaries; Impurities; Temperature; Thermal resistance;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2006 IEEE International
Conference_Location :
South Lake Tahoe, CA
Print_ISBN :
1-4244-0296-4
DOI :
10.1109/IRWS.2006.305227
