• DocumentCode
    3475893
  • Title

    Modeling for contact resistance between metallic carbon nanotubes and semiconducting substrates of field emission devices

  • Author

    Liu Lining ; Li Bin

  • Author_Institution
    Sch. of Electron. & Inf. Eng., South China Univ. of Technol., Guangzhou, China
  • fYear
    2013
  • fDate
    3-5 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A Schottky Barrier would inevitably exist in Metal-Semiconductor contact, which will cause a contact resistance that effect emission current of field emission devices. A model of contact resistance between metallic carbon nanotubes (CNT) and doped semiconducting substrates is proposed in this paper to evaluate this effect. Besides, factors that impact this contact are discussed, which could be valuable for the design of CNT field emission devices.
  • Keywords
    carbon nanotubes; contact resistance; field emission; CNT field emission devices; Schottky barrier; contact resistance modeling; doped semiconducting substrates; effect emission current; metal-semiconductor contact; metallic carbon nanotubes; Computational modeling; Semiconductor device modeling; Carbon Nanotube (CNT); Contact resistance; Emission Current; Field Emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Type

    conf

  • DOI
    10.1109/EDSSC.2013.6628103
  • Filename
    6628103