DocumentCode :
3476036
Title :
Parametric reduced order modeling for interconnect analysis
Author :
Shi, Guangming ; Shi, C.-J.R.
Author_Institution :
University of Washington
fYear :
2004
fDate :
27-30 Jan. 2004
Firstpage :
775
Lastpage :
780
Abstract :
VLSI circuit models are subject to parameter variations due to temperature, geometry, process, and operating conditions. Parameter model order reduction is motivated by such practical problems. The purpose is to obtain a parametric reduced order model so that repeated reduction can be avoided. In this paper we propose two techniques: a nominal projection technique and an interpolation technique. The nominal projection technique is effective for small parameter perturbation by using a robust projection. The interpolation technique takes the advantage of simple matrix structure resulting from the PVL algorithm. A new moment matching concept in the discrete-time domain is also introduced, which is intended for a better performance in waveform matching and stability. Interconnect examples are used to test the effectiveness of the proposed methods.
Keywords :
Frequency; Integrated circuit interconnections; Interpolation; Parametric statistics; RLC circuits; Reduced order systems; Robust stability; Solid modeling; Very large scale integration; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2004. Proceedings of the ASP-DAC 2004. Asia and South Pacific
Conference_Location :
Yohohama, Japan
Print_ISBN :
0-7803-8175-0
Type :
conf
DOI :
10.1109/ASPDAC.2004.1337699
Filename :
1337699
Link To Document :
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