• DocumentCode
    3476036
  • Title

    Parametric reduced order modeling for interconnect analysis

  • Author

    Shi, Guangming ; Shi, C.-J.R.

  • Author_Institution
    University of Washington
  • fYear
    2004
  • fDate
    27-30 Jan. 2004
  • Firstpage
    775
  • Lastpage
    780
  • Abstract
    VLSI circuit models are subject to parameter variations due to temperature, geometry, process, and operating conditions. Parameter model order reduction is motivated by such practical problems. The purpose is to obtain a parametric reduced order model so that repeated reduction can be avoided. In this paper we propose two techniques: a nominal projection technique and an interpolation technique. The nominal projection technique is effective for small parameter perturbation by using a robust projection. The interpolation technique takes the advantage of simple matrix structure resulting from the PVL algorithm. A new moment matching concept in the discrete-time domain is also introduced, which is intended for a better performance in waveform matching and stability. Interconnect examples are used to test the effectiveness of the proposed methods.
  • Keywords
    Frequency; Integrated circuit interconnections; Interpolation; Parametric statistics; RLC circuits; Reduced order systems; Robust stability; Solid modeling; Very large scale integration; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference, 2004. Proceedings of the ASP-DAC 2004. Asia and South Pacific
  • Conference_Location
    Yohohama, Japan
  • Print_ISBN
    0-7803-8175-0
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2004.1337699
  • Filename
    1337699