Title :
Towards ideal NOx control technology using plasma-chemical hybrid process
Author :
Yamamoto, T. ; Okubo, M. ; Hayakawa, K. ; Kitaura, K.
Author_Institution :
Dept. of Energy Syst. Eng., Osaka Prefecture Univ., Japan
Abstract :
The plasma-chemical hybrid process developed was extremely effective and economical in comparison with the conventional selective catalytic reduction (SCR) system and other technologies for NOx removal from thermal power plant flue gas emissions. A series of experiments were performed to quantify all the reaction byproducts such as N2O, CO, HNO2, HNO3 and NO3 - and to evaluate NOx removal efficiency. The optimum plasma reactor and its operating characteristics were investigated in regard to reaction byproducts and NOx removal efficiency using the ordinary ferroelectric packed-bed plasma reactor and the barrier type packed-bed plasma reactor. The oxidation from NO to NO2 without decreasing NOx concentration (i.e., minimum reaction byproducts) and with the least power consumption is the key for the optimum reactor design. The produced NO2 was totally converted to N2 and Na2SO4 with Na2SO3 scrubbing. The barrier-type packed-bed plasma reactor having a 1.5 mm diameter electrode and 3 mm diameter BaTiO3 pellets followed by the chemical reactor showed the superior results: extremely low operating cost (less than 1/15 of the SCR process) and nearly 100% NOx removal with less than 6 ppm of N2O and 5 ppm of CO
Keywords :
air pollution control; nitrogen compounds; plasma materials processing; thermal power stations; 1.5 mm; 3 mm; BaTiO3; N2; NO; NOx control technology; Na2SO3; Na2SO4; air emissions control; barrier-type packed-bed plasma reactor; flue gas emissions; operating characteristics; operating costs; plasma-chemical hybrid process; reaction byproducts; removal efficiency; thermal power plant; Ferroelectric materials; Flue gases; Inductors; Oxidation; Performance evaluation; Plasma properties; Power generation; Power generation economics; Power system economics; Thyristors;
Conference_Titel :
Industry Applications Conference, 1999. Thirty-Fourth IAS Annual Meeting. Conference Record of the 1999 IEEE
Conference_Location :
Phoenix, AZ
Print_ISBN :
0-7803-5589-X
DOI :
10.1109/IAS.1999.805940