Title :
High responsivity phototransistor with body-strapped base in standard SiGe BiCMOS technology
Author :
Hsu, Klaus Y. J. ; Liao, Brett W. C.
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
A new two-terminal phototransistor structure in standard BiCMOS technologies is proposed in this work. By connecting the floating base terminal to the local body terminal, the parasitic photo-generated carriers in the substrate are used to bias the base and to enhance the response of the phototransistor. Samples have been fabricated in a commercial 0.18 μm SiGe BiCMOS process. While the device without base-body connection shows a respectable 3.7 A/W peak responsivity at 630 nm wavelength, the phototransistor with base-body connection reaches an impressive 75 A/W peak responsivity at 750 nm wavelength and the dark current density is only 0.5 μA/cm2. Characterization of the substrate current in the phototransistors verified that the response enhancement is due to the carrier generation in the substrate.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; current density; phototransistors; SiGe; base-body connection; body-strapped base; carrier generation; dark current density; floating base terminal; local body terminal; parasitic photogenerated carriers; response enhancement; size 0.18 mum; standard BiCMOS technologies; substrate current; two-terminal phototransistor structure; wavelength 630 nm; wavelength 750 nm; Image resolution; Silicon germanium; BiCMOS; Phototransistor; Self-Bias;
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
Conference_Location :
Hong Kong
DOI :
10.1109/EDSSC.2013.6628154