Title :
Current and emerging production applications/trends of MeV technology
Author :
Borland, John O.
Author_Institution :
Ion Technol. Div., Genus Inc., Newburyport, MA, USA
Abstract :
Current production applications of MeV implantation will be reviewed focusing on CMOS memory (DRAM, SRAM and Flash) and CMOS logic (ASIC and Microprocessor) device manufacturing. Also, the motivation from a manufacturing point of view will be presented for MeV twin and triple well formation including process simplification, cost reduction and improved productivity/capacity and profits. Replacement of traditional medium current implanters will also be discussed along with emerging and future production applications/trends
Keywords :
CMOS integrated circuits; ion implantation; technological forecasting; ASIC; CMOS logic; CMOS memory; DRAM; Flash memory; MeV ion implantation technology; Microprocessor; SRAM; device manufacturing; high energy implanter; productivity; triple well; twin well; Application specific integrated circuits; Boron; CMOS logic circuits; CMOS technology; Costs; Implants; Logic devices; Manufacturing; Production; Random access memory;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586101
