DocumentCode
3477799
Title
Current uniformity improvement in flexible resistive memory
Author
Zhi-Wei Zheng ; Chun-Hu Cheng ; Kun-I Chou ; Ming Liu ; Chin, Alvin
Author_Institution
Inst. of Microelectron., Beijing, China
fYear
2013
fDate
3-5 June 2013
Firstpage
1
Lastpage
2
Abstract
High uniform current distribution, good endurance, and low 28 μW switching power are successfully achieved in Ni/GeOx/TiOy/TaN resistive random access memory devices on flexible polyimide substrate. The good performances are attributed to the nitrogen-rich TaN to increase the oxidation resistance and decrease the TaON and oxygen vacancies formation from x-ray photoelectron spectroscopy measurements, where such oxygen vacancies are related to current conduction at high resistance state. The present results demonstrate that the device with nitrogen-rich TaN electrode has a strong potential for future low-cost high-performance flexible memory application.
Keywords
X-ray photoelectron spectra; current distribution; flexible electronics; germanium compounds; nickel; random-access storage; tantalum compounds; titanium compounds; vacancies (crystal); Ni-GeOx-TiOy-TaN; X-ray photoelectron spectroscopy measurements; current conduction; current uniformity improvement; electrode; flexible polyimide substrate; flexible resistive memory; high resistance state; high uniform current distribution; low-cost high-performance flexible memory application; oxidation resistance; oxygen vacancies; resistive random access memory devices; Current distribution; Electrodes; Nickel; Nitrogen; Plasmas; Resistance; Switches; flexible; nitrogen-rich TaN; resistive memory;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
Conference_Location
Hong Kong
Type
conf
DOI
10.1109/EDSSC.2013.6628193
Filename
6628193
Link To Document