• DocumentCode
    3477799
  • Title

    Current uniformity improvement in flexible resistive memory

  • Author

    Zhi-Wei Zheng ; Chun-Hu Cheng ; Kun-I Chou ; Ming Liu ; Chin, Alvin

  • Author_Institution
    Inst. of Microelectron., Beijing, China
  • fYear
    2013
  • fDate
    3-5 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    High uniform current distribution, good endurance, and low 28 μW switching power are successfully achieved in Ni/GeOx/TiOy/TaN resistive random access memory devices on flexible polyimide substrate. The good performances are attributed to the nitrogen-rich TaN to increase the oxidation resistance and decrease the TaON and oxygen vacancies formation from x-ray photoelectron spectroscopy measurements, where such oxygen vacancies are related to current conduction at high resistance state. The present results demonstrate that the device with nitrogen-rich TaN electrode has a strong potential for future low-cost high-performance flexible memory application.
  • Keywords
    X-ray photoelectron spectra; current distribution; flexible electronics; germanium compounds; nickel; random-access storage; tantalum compounds; titanium compounds; vacancies (crystal); Ni-GeOx-TiOy-TaN; X-ray photoelectron spectroscopy measurements; current conduction; current uniformity improvement; electrode; flexible polyimide substrate; flexible resistive memory; high resistance state; high uniform current distribution; low-cost high-performance flexible memory application; oxidation resistance; oxygen vacancies; resistive random access memory devices; Current distribution; Electrodes; Nickel; Nitrogen; Plasmas; Resistance; Switches; flexible; nitrogen-rich TaN; resistive memory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Type

    conf

  • DOI
    10.1109/EDSSC.2013.6628193
  • Filename
    6628193