DocumentCode :
3477799
Title :
Current uniformity improvement in flexible resistive memory
Author :
Zhi-Wei Zheng ; Chun-Hu Cheng ; Kun-I Chou ; Ming Liu ; Chin, Alvin
Author_Institution :
Inst. of Microelectron., Beijing, China
fYear :
2013
fDate :
3-5 June 2013
Firstpage :
1
Lastpage :
2
Abstract :
High uniform current distribution, good endurance, and low 28 μW switching power are successfully achieved in Ni/GeOx/TiOy/TaN resistive random access memory devices on flexible polyimide substrate. The good performances are attributed to the nitrogen-rich TaN to increase the oxidation resistance and decrease the TaON and oxygen vacancies formation from x-ray photoelectron spectroscopy measurements, where such oxygen vacancies are related to current conduction at high resistance state. The present results demonstrate that the device with nitrogen-rich TaN electrode has a strong potential for future low-cost high-performance flexible memory application.
Keywords :
X-ray photoelectron spectra; current distribution; flexible electronics; germanium compounds; nickel; random-access storage; tantalum compounds; titanium compounds; vacancies (crystal); Ni-GeOx-TiOy-TaN; X-ray photoelectron spectroscopy measurements; current conduction; current uniformity improvement; electrode; flexible polyimide substrate; flexible resistive memory; high resistance state; high uniform current distribution; low-cost high-performance flexible memory application; oxidation resistance; oxygen vacancies; resistive random access memory devices; Current distribution; Electrodes; Nickel; Nitrogen; Plasmas; Resistance; Switches; flexible; nitrogen-rich TaN; resistive memory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
Conference_Location :
Hong Kong
Type :
conf
DOI :
10.1109/EDSSC.2013.6628193
Filename :
6628193
Link To Document :
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