Title :
H+ implantation in Si for the void cut SOI manufacturing
Author :
Hara, Tenshi ; Kakizaki, Yasuo ; Oshima, Sotaro ; Kihana, Takeo ; Kitamura, Taira ; Kajiyama, Kenji ; Yoneda, Tomoaki ; Inoue, M.
Author_Institution :
Hosei Univ., Tokyo, Japan
Abstract :
Delamination of a thin Si layer from an Si wafer by high dose H + implantation is studied. Hydrogen ions are implanted into (100) p-Si through a 100 nm thick oxide layer at 100 keV with different doses. With annealing at temperatures above 500°C, splitting of the Si layer appears at a depth of 0.85 μm at doses above 5.0×10 16 ions/cm2. The width of the slit gap ranges from 20 to 30 nm. Average roughness of the split layer surface is 7.3 nm. However, point defects still exist at the surface of the Si layer after splitting of the layer at 600°C. This defect decreases in density with increasing temperature and disappears at 900°C
Keywords :
Rutherford backscattering; annealing; atomic force microscopy; delamination; elemental semiconductors; hydrogen; ion implantation; point defects; silicon; silicon-on-insulator; surface topography; transmission electron microscopy; (100) p-Si substrate; 100 keV; 100 nm; 20 to 30 nm; 500 to 900 C; AFM; RBS; Si layer splitting; Si:H; Si:H-SiO2; XTEM; annealing; defect density; high dose H+ implantation; oxide layer; point defects; slit gap width; split layer surface roughness; thin Si layer delamination; void cut SOI manufacturing; Amorphous materials; Annealing; Atomic force microscopy; Atomic layer deposition; Delamination; Density measurement; Hydrogen; Manufacturing; Surface cracks; Temperature distribution;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586115
