• DocumentCode
    3478442
  • Title

    Ionizing radiation induced leakage current in the PD-SOI devices with different layout structures

  • Author

    Liu Yuan ; He Yu-Juan ; En Yun-Fei ; Shi Qian

  • Author_Institution
    Electron. Component Lab., Sci. & Technol. on Reliability Phys. & Applic., Guangzhou, China
  • fYear
    2013
  • fDate
    3-5 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Total dose dependence of leakage current in the partially depleted SOI devices with different layout structures are presented. The experimental results show that the leakage currents in the irradiated PD-SOI device with standard structure are significant affected by trench sidewall leakage, but the leakage currents in the enclosed gate and H gate structures are more affected by the conduction of back gate parasitic transistor and gate induced drain leakage currents.
  • Keywords
    elemental semiconductors; radiation hardening (electronics); silicon-on-insulator; transistors; H gate structure; back gate parasitic transistor conduction; enclosed gate structure; gate-induced drain leakage current; ionizing radiation-induced leakage current; irradiated PD-SOI device; layout structures; partially-depleted SOI devices; total dose dependence; trench sidewall leakage; Silicon on insulator; ionizing radiation; leakage current; partially depleted;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
  • Conference_Location
    Hong Kong
  • Type

    conf

  • DOI
    10.1109/EDSSC.2013.6628221
  • Filename
    6628221