DocumentCode
3478442
Title
Ionizing radiation induced leakage current in the PD-SOI devices with different layout structures
Author
Liu Yuan ; He Yu-Juan ; En Yun-Fei ; Shi Qian
Author_Institution
Electron. Component Lab., Sci. & Technol. on Reliability Phys. & Applic., Guangzhou, China
fYear
2013
fDate
3-5 June 2013
Firstpage
1
Lastpage
2
Abstract
Total dose dependence of leakage current in the partially depleted SOI devices with different layout structures are presented. The experimental results show that the leakage currents in the irradiated PD-SOI device with standard structure are significant affected by trench sidewall leakage, but the leakage currents in the enclosed gate and H gate structures are more affected by the conduction of back gate parasitic transistor and gate induced drain leakage currents.
Keywords
elemental semiconductors; radiation hardening (electronics); silicon-on-insulator; transistors; H gate structure; back gate parasitic transistor conduction; enclosed gate structure; gate-induced drain leakage current; ionizing radiation-induced leakage current; irradiated PD-SOI device; layout structures; partially-depleted SOI devices; total dose dependence; trench sidewall leakage; Silicon on insulator; ionizing radiation; leakage current; partially depleted;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits (EDSSC), 2013 IEEE International Conference of
Conference_Location
Hong Kong
Type
conf
DOI
10.1109/EDSSC.2013.6628221
Filename
6628221
Link To Document