Metals-contamination-reduction program for the Varian EHP-220/500 medium-current ion implanter

Author

Swenson, D.R. ; Downey, D.F. ; Walther, S.R. ; Renau, A. ; Gammel, G. ; Mack, M.E.

Author_Institution

Varian Ion Implant Syst., Gloucester, MA, USA

fYear

1996

fDate

16-21 Jun 1996

Firstpage

139

Lastpage

142

Abstract

The results of a program to minimize metals contamination for the Varian EHP-220/500 medium-current ion implanter are presented. Additional graphite and Si-coated shields were added to the beamline and metal contamination associated with 80-kV As⁺ implants was measured by SIMS. Total contamination (surface + energetic) was reduced to as low as 28 ppm for Al, 3 ppm for Fe and 2 ppm for Cr. Energetic components of the contamination are consistent with models of knock-on distributions from an 80 kV As⁺ implant

Keywords

chemical variables measurement; ion implantation; mass spectroscopic chemical analysis; metals; secondary ion mass spectroscopy; surface contamination; 80 kV; 80-kV As⁺ implants; Al; Cr; Fe; SIMS; Si-coated shields; Si:As,Al,Fe,Cr; Varian EHP-220/500 medium-current ion implanter; beamline; energetic components; graphite coated shields; knock-on distributions; metals-contamination-reduction program; surface contamination; total contamination; Atomic measurements; Implants; Iron; Lenses; Magnetic shielding; Pollution measurement; Sputtering; Steel; Structural beams; Surface contamination;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology. Proceedings of the 11th International Conference on

Conference_Location

Austin, TX

Print_ISBN

0-7803-3289-X

Type

conf

DOI

10.1109/IIT.1996.586154

Filename

586154