DocumentCode
3479156
Title
Production implant monitoring using the Therma-Probe 500
Author
Pearce, Nick ; Zhou, Li ; Graves, Phillip ; Takeo, Hiroshi ; Romig, Terry
Author_Institution
Therma-Wave Inc., Fremont, CA, USA
fYear
1996
fDate
16-21 Jun 1996
Firstpage
206
Lastpage
209
Abstract
This paper introduces a new implant monitoring tool, the Therma-Probe 500 (TP500), capable of fully automated real-time measurements on product wafers. This new Therma-Probe combines a 100% increase in throughput with a state-of-the-art pattern recognition system to enable quick and effortless location and measurement of sites as small as 10 μm×10 μm anywhere on product wafers. This paper also demonstrates that the new TP500 system has excellent sensitivity in monitoring implant dose and energy
Keywords
integrated circuit measurement; ion implantation; monitoring; pattern recognition equipment; production testing; Therma-Probe 500; fully automated real-time measurements; implant dose; implant energy; pattern recognition system; product wafers; production implant monitoring; sensitivity; Condition monitoring; Implants; Plasma measurements; Plasma waves; Process control; Production; Solid lasers; Testing; Throughput; Time measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586185
Filename
586185
Link To Document