Title :
Micro uniformity in MeV implantation
Author :
Heden, Craig ; Davis, Bill ; Heckman, Valarie ; Weisenberger, Wes ; McMillen, James A.
Author_Institution :
Ion Implant Services, Sunnyvale, CA, USA
Abstract :
Mechanically caused nonuniformity of low dose, high energy implants in the form of striping has been detected in unprecedented detail using a high resolution optical testing technique. A comparison between optical monitoring and 4 point probe contour mapping in detecting this problem is presented. A description of the mechanical problem on the implanter is described and recommendations for planned maintenance and testing for all mechanically scanned implanters in general which perform low dose implants is suggested
Keywords :
ion implantation; four point probe contour mapping; low dose high energy ion implantation; maintenance; mechanical scanning; micro uniformity; optical testing; striping; Computer aided software engineering; High speed optical techniques; Implants; Ion beams; Monitoring; Optical films; Performance evaluation; Probes; Testing; Wheels;
Conference_Titel :
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-3289-X
DOI :
10.1109/IIT.1996.586191
