• DocumentCode
    3479967
  • Title

    Heat -Resistant, Self-Releasing Tape And Its Application

  • Author

    Hasegawa, Akio

  • Author_Institution
    Sekisui Chemical Co. Ltd., Tokyo
  • fYear
    2007
  • fDate
    Jan. 16 2007-Yearly 18 2007
  • Firstpage
    290
  • Lastpage
    292
  • Abstract
    We have developed Self-releasing Adhesive Tape ldquoSELFArdquo for manufacturing of ultra thin semiconductor wafers. With this adhesive tape, the semiconductor wafer is fixed and supported properly on glass board. After ultra thin grinding process and other processes, glass board starts self-releasing with UV irradiation. This tape guarantees ultra thin wafers are safely handled by Glass Wafer Support System (GWSS) in some treatment process. This report states the basic self-releasing mechanism and the characteristics of SELFA and the applications to an ultra thin manufacturing system for semiconductor wafers.
  • Keywords
    adhesives; tape automated bonding; wafer-scale integration; SELFA; UV irradiation; glass board; glass wafer support system; heat-resistant; self-releasing adhesive tape; ultra thin manufacturing system; ultra thin semiconductor wafers; Chemicals; Circuit stability; Glass; Heat treatment; Manufacturing systems; Resistance heating; Semiconductor device manufacture; Surface treatment; Temperature; Thermal resistance; Glass Wafer Support System (GWSS); heat resistance; self-releasing tape;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Polymers and Adhesives in Microelectronics and Photonics, 2007. Polytronic 2007. 6th International Conference on
  • Conference_Location
    Odaiba, Tokyo
  • Print_ISBN
    978-1-4244-1186-3
  • Electronic_ISBN
    978-1-4244-1186-3
  • Type

    conf

  • DOI
    10.1109/POLYTR.2007.4339185
  • Filename
    4339185