DocumentCode
3479967
Title
Heat -Resistant, Self-Releasing Tape And Its Application
Author
Hasegawa, Akio
Author_Institution
Sekisui Chemical Co. Ltd., Tokyo
fYear
2007
fDate
Jan. 16 2007-Yearly 18 2007
Firstpage
290
Lastpage
292
Abstract
We have developed Self-releasing Adhesive Tape ldquoSELFArdquo for manufacturing of ultra thin semiconductor wafers. With this adhesive tape, the semiconductor wafer is fixed and supported properly on glass board. After ultra thin grinding process and other processes, glass board starts self-releasing with UV irradiation. This tape guarantees ultra thin wafers are safely handled by Glass Wafer Support System (GWSS) in some treatment process. This report states the basic self-releasing mechanism and the characteristics of SELFA and the applications to an ultra thin manufacturing system for semiconductor wafers.
Keywords
adhesives; tape automated bonding; wafer-scale integration; SELFA; UV irradiation; glass board; glass wafer support system; heat-resistant; self-releasing adhesive tape; ultra thin manufacturing system; ultra thin semiconductor wafers; Chemicals; Circuit stability; Glass; Heat treatment; Manufacturing systems; Resistance heating; Semiconductor device manufacture; Surface treatment; Temperature; Thermal resistance; Glass Wafer Support System (GWSS); heat resistance; self-releasing tape;
fLanguage
English
Publisher
ieee
Conference_Titel
Polymers and Adhesives in Microelectronics and Photonics, 2007. Polytronic 2007. 6th International Conference on
Conference_Location
Odaiba, Tokyo
Print_ISBN
978-1-4244-1186-3
Electronic_ISBN
978-1-4244-1186-3
Type
conf
DOI
10.1109/POLYTR.2007.4339185
Filename
4339185
Link To Document