DocumentCode
3480953
Title
Energy values of very low-energy ion beams
Author
Sakudo, N. ; Hayashi, K. ; Yukishiro, Y.
Author_Institution
Kanazawa Inst. of Technol., Ishikawa, Japan
fYear
1996
fDate
16-21 Jun 1996
Firstpage
327
Lastpage
330
Abstract
Ion beams of energy levels less than 100 eV are used to form special films with excellent physical and chemical properties. However, their energy values are inaccurate unless the plasma potentials are taken into account with their total energies. For simple plasmas which consist of singly-charged ions of a single species and electrons of a single electron temperature, we have formerly reported how to obtain accurate values. In this paper, we further investigate the exact energy values for a source plasma having double electron temperatures as is often the case with industrially used ion sources
Keywords
energy measurement; ion beams; particle beam diagnostics; particle beam extraction; plasma diagnostics; plasma temperature; 50 to 100 eV; double electron temperatures; energy values; ion beam deposition; plasma potentials; source plasma; very low-energy ion beams; Chemicals; Electrons; Energy states; Ion beams; Ion sources; Plasma applications; Plasma chemistry; Plasma properties; Plasma sources; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. Proceedings of the 11th International Conference on
Conference_Location
Austin, TX
Print_ISBN
0-7803-3289-X
Type
conf
DOI
10.1109/IIT.1996.586275
Filename
586275
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