DocumentCode
348121
Title
Lithography in a 300 mm pilot production line
Author
Ganz, D. ; Charles, A. ; Grant, L. ; Hornig, S. ; Hraschan, G. ; Maltabes, J. ; Metzdorf, T. ; Otto, R. ; Schedel, T. ; Schmidt, S. ; Schuster, R.
Author_Institution
Semicond. 300, Dresden, Germany
fYear
1999
fDate
1999
Firstpage
357
Lastpage
360
Abstract
This paper discusses the performance of the initial 300 mm lithography tool set installed in a pilot line in Dresden, Germany. The product used for evaluating and debugging the tool set is a 0.25-micron ground rule 64 M DRAM. This was chosen for the ability to benchmark against 200 mm DRAM manufacturing data. We have produced several lots of wafers with measurable yield. These lots have produced data on overlay, CD and run to run performance of the lithography tools on actual products
Keywords
DRAM chips; integrated circuit yield; ultraviolet lithography; 0.25 micron; 300 mm; 64 Mbit; CD; DRAM; DUV lithography; benchmarking; debugging; lithography tool set; manufacturing data; measurable yield; overlay; pilot line; run to run performance; Coatings; Counting circuits; Debugging; Large Hadron Collider; Lithography; Production; Random access memory; Table lookup; Testing; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location
Santa Clara, CA
ISSN
1523-553X
Print_ISBN
0-7803-5403-6
Type
conf
DOI
10.1109/ISSM.1999.808810
Filename
808810
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