DocumentCode :
3481420
Title :
High refractive index polymer materials for Photonic devices
Author :
Ho, W.F. ; Uddin, M.A. ; Chan, H.P.
Author_Institution :
Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon
fYear :
2008
fDate :
17-20 Aug. 2008
Firstpage :
1
Lastpage :
4
Abstract :
An organometallic polymer and a conventional epoxy material are combined to form a hybrid for high index contrast optical waveguide devices. When cured at elevated temperatures, the organometallic polymer decomposes to form a high index polymer film of waveguide structure. These hybrid high refractive index films are stable enough for photolithographic patterning of optical waveguide structure.
Keywords :
curing; optical waveguides; organometallic compounds; polymer films; refractive index; curing; elevated temperatures; epoxy material; high index contrast optical waveguide devices; high index polymer film; hybrid high refractive index films; organometallic polymer; photolithographic patterning; photonic devices; Optical devices; Optical films; Optical materials; Optical polymers; Optical refraction; Optical variables control; Optical waveguides; Polymer films; Refractive index; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Portable Information Devices, 2008 and the 2008 7th IEEE Conference on Polymers and Adhesives in Microelectronics and Photonics. PORTABLE-POLYTRONIC 2008. 2nd IEEE International Interdisciplinary Conference on
Conference_Location :
Garmish-Partenkirchen
Print_ISBN :
978-1-4244-2141-1
Electronic_ISBN :
978-1-4244-2142-8
Type :
conf
DOI :
10.1109/PORTABLE-POLYTRONIC.2008.4681284
Filename :
4681284
Link To Document :
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