DocumentCode :
3481457
Title :
Practical techniques for optical characterization of III-V heterostructures
Author :
Wicks, G.W.
Author_Institution :
Inst. of Opt., Rochester Univ., NY, USA
Volume :
2
fYear :
1994
fDate :
31 Oct-3 Nov 1994
Firstpage :
29
Abstract :
This paper discusses two optical measurements, photoluminescence (PL) and Raman spectroscopies, and their use for analysis of the structure of III-V heterointerfaces grown by molecular beam epitaxy and organo-metallic vapor phase epitaxy. The emphasis here is on using these techniques in ways that require only simple, semi-quantitative analyses. The simple analyses enable rapid determinations of the structures of samples. The quick turn around time of the measurements and conclusions makes it possible to optimize the epitaxial growth by iterating the cycle of grow/characterize/regrow rapidly enough (a few cycles/day), so that the conditions in the epitaxial reactor do not drift appreciably
Keywords :
III-V semiconductors; GaAs-AlGaAs; III-V heterostructures; Raman spectroscopies; epitaxial growth; epitaxial reactor; grow/characterize/regrow; iterating; molecular beam epitaxy; optical characterization; optical measurements; organo-metallic vapor phase epitaxy; photoluminescence; rapid determination; semi-quantitative analyses; structure determination; Acoustic measurements; Atom optics; Epitaxial growth; III-V semiconductor materials; Optical scattering; Optical superlattices; Phonons; Photonic band gap; Raman scattering; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1994. LEOS '94 Conference Proceedings. IEEE
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-1470-0
Type :
conf
DOI :
10.1109/LEOS.1994.586297
Filename :
586297
Link To Document :
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